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Ion beam Sputter
Magnetron Sputter
E-beam Coater w/w IAD
Optical monitoring System
Filter testing equipments
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Company
About Gilitek
Careers
News
History
Quality Policy
Products
Ion beam Sputter
Magnetron Sputter
E-beam Coater w/w IAD
Optical monitoring System
Filter testing equipments
Service
Contact
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Magnetron Sputter
Magnetron Sputter for DWDM, CWDM and LanWDM filter mass production
• Substrate size: 3’ ~ 6’ diameter or 4x6’ planetary jig
• Deposition source, 3 x 8’ targets with pulse DC power supplies + plasma assistant source.
• Film thickness monitor, Laser optical monitor with film uniformity automatic control
Magnetron Sputter for DWDM, CWDM and LanWDM filter mass production
• Substrate size: 3’~6’ diameter or 4 x 6’ diameter planetary jig
• Deposition source: 4 x 8’ targets with MF power supplies
• Film thickness monitor, Laser optical monitor with film uniformity automatic control
Magnetron Sputter for metal film and /or dielectric film coating
• Substrate size: 24’ Diameter,
• Option one, 3 x 10’ targets with pulse DC power supply w/w assistant ion source
• Option two, 4x 10’ targets with MF power supply
• Film thickness monitor, Timer / optical monitor
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Tel:(385)252-8526
E-mail:guigang@gilitek.com
1525 McCarthy BLVD, #1045, Milpitas, CA 95035
website:www.Gilitek.com
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