Ion beam Sputter_GLLITEK CORPORATION WELCOME TO INQUIER

• Substrate size: 14’ Diameter

• Deposition source, I6cm RF ion source, beam current 600mA, beam voltage 1250V

• Aassistant source, plasma ion source

• Film thickness monitor, optical monitor/timer/crystal monitor

• Substrate size: 12’ Diameter

• Deposition source, I6cm RF ion source, beam current 800mA, beam voltage 1500V

• Assistant source: 12cm RF ion source, beam current 400mA, beam voltage 1500V

• Film thickness monitor: Optical monitoring with film uniformity feedback control system

• Coating area, planetary coating jig, 4x 8.5’ Diameter,

• For deposition, I6cm RF ion source, beam current 800mA, beam voltage 1500V

• For Assistance, 12cm RF ion source, beam current 500mA, beam voltage 1500V

• Film thickness monitor, Timer , crystal monitor, optical monitor